Panoptes Virtual Metrology

Reinvents process monitoring and control

Panoptes VM predicts key features of a process outcome based on equipment sensor data for real-time process monitoring and control.

Features

To overcome the limit on metrology resources, Panoptes IM enhances higher-throughput, lower-quality images by advanced denoising techniques. This enables faster acquisition without any loss in the image quality. In addition to automatically measuring all conventional measurands in a given image, Panoptes IM also detects anomalies within the image and identifies their causes, which serves as another indicator for yield changes. In order to handle diverse metrology recipes, Panoptes IM provides a unified set of recipes, or methods and procedures for measuring features in images. These recipes are created, tested, deployed, and managed in an engineering platform, which is integrated seamlessly with existing manufacturing systems.
Image Enhancement
reduces the image acquisition time without accuracy loss
Anomaly Detection
alerts for outliers and
identifies possible causes
Automatic Metrology
adapts common recipes quickly to new products, processes, and measurands
Integrated Engineering Platform
creates, tests, deploys, and
manages diverse recipes

SK hynix Deploys Gauss Labs’s AI-Based Virtual Metrology Solution to Predict Wafer Manufacturing Process Outcomes

By predicting wafer process outcomes based on sensor data, Panoptes VM reduces process variability by 21.5% on average and ultimately improves the yield as well.
Learn More

Download the product brochure

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Panoptes Root Cause Analysis (RCA)

Revolutionizes the workflow of process engineers

Panoptes RCA is an AI-powered assistant that provides process engineers with real-time analysis of anomalies and alarm events in statistical process control.
AI technology image with finger pointing to data tables

Features

To overcome the limit on metrology resources, Panoptes IM enhances higher-throughput, lower-quality images by advanced denoising techniques. This enables faster acquisition without any loss in the image quality. In addition to automatically measuring all conventional measurands in a given image, Panoptes IM also detects anomalies within the image and identifies their causes, which serves as another indicator for yield changes. In order to handle diverse metrology recipes, Panoptes IM provides a unified set of recipes, or methods and procedures for measuring features in images. These recipes are created, tested, deployed, and managed in an engineering platform, which is integrated seamlessly with existing manufacturing systems.
Image Enhancement
reduces the image acquisition time without accuracy loss
Anomaly Detection
alerts for outliers and
identifies possible causes
Automatic Metrology
adapts common recipes quickly to new products, processes, and measurands
Integrated Engineering Platform
creates, tests, deploys, and
manages diverse recipes

Download the Product Brochure

DOWNLOAD
DOWNLOAD

Shatters the limit of conventional image metrology solutions

Panoptes IM is an integrated image metrology solution that overcomes the physical and software limits of conventional measurement tools through state-of-the-art computer vision technology.
Data technology board

Features

To overcome the limit on metrology resources, Panoptes IM enhances higher-throughput, lower-quality images by advanced denoising techniques. This enables faster acquisition without any loss in the image quality. In addition to automatically measuring all conventional measurands in a given image, Panoptes IM also detects anomalies within the image and identifies their causes, which serves as another indicator for yield changes. In order to handle diverse metrology recipes, Panoptes IM provides a unified set of recipes, or methods and procedures for measuring features in images. These recipes are created, tested, deployed, and managed in an engineering platform, which is integrated seamlessly with existing manufacturing systems.
Image Enhancement
reduces the image acquisition time without accuracy loss
Anomaly Detection
alerts for outliers and
identifies possible causes
Automatic Metrology
adapts common recipes quickly to new products, processes, and measurands
Integrated Engineering Platform
creates, tests, deploys, and
manages diverse recipes

Download the Product Brochure

DOWNLOAD
DOWNLOAD
Panoptes Virtual Metrology

Reinvents process monitoring and control

Panoptes VM predicts key features of a process outcome based on equipment sensor data for real-time process monitoring and control.
Request a Demo
Panoptes Virtual Metrology

Reinvents process monitoring and control

Panoptes VM predicts key features of a process outcome based on equipment sensor data for real-time process monitoring and control.
Request a Demo

Features

Panoptes VM is the industry’s first successful virtual metrology solution that predicts process outcomes reliably and robustly for real-time process monitoring and control. It tracks the temporal changes in sensor and measurement data by updating and optimizing the model continuously. Panoptes VM navigates massive data from hundreds of sensors and other metadata, and selects most relevant features for best prediction performance. By aggregating measurement data from multiple machines and tools for the same process, Panoptes VM overcomes the scarcity of the measurement data while providing precise and individualized models for the multiple machines and tools. Although all these core features are fully automatized without any manual operation, process engineers can incorporate their domain knowledge on process data and physics into main steps of predictive modeling.
Robust Prediction
provides reliable and consistent results against data drift and shift
Automatic Feature Selection
shows important input parameters with high impact on quality and yield
Flexible Customization
allows process engineers to embed domain knowledge in feature selection and modeling
Aggregate Modeling
builds individualized models across multiple tools and machines for the same process
Featured icon white circle
Automatic Model Update
enables the model to quickly relearn without any manual intervention

SK hynix Deploys Gauss Labs’s AI-Based Virtual Metrology Solution to Predict Wafer Manufacturing Process Outcomes

By predicting wafer process outcomes based on sensor data, Panoptes VM reduces process variability by 21.5% on average and ultimately improves the yield as well.
Learn More

Download the product brochure

DOWNLOAD
DOWNLOAD
Panoptes Virtual Metrology

Reinvents process monitoring and control

Panoptes VM predicts key features of a process outcome based on equipment sensor data for real-time process monitoring and control.

Features

Panoptes VM is the industry’s first successful virtual metrology solution that predicts process outcomes reliably and robustly for real-time process monitoring and control. It tracks the temporal changes in sensor and measurement data by updating and optimizing the model continuously. Panoptes VM navigates massive data from hundreds of sensors and other metadata, and selects most relevant features for best prediction performance. By aggregating measurement data from multiple machines and tools for the same process, Panoptes VM overcomes the scarcity of the measurement data while providing precise and individualized models for the multiple machines and tools. Although all these core features are fully automatized without any manual operation, process engineers can incorporate their domain knowledge on process data and physics into main steps of predictive modeling.
Robust Prediction
provides reliable and consistent results against data drift and shift
Automatic Feature Selection
shows important input parameters with high impact on quality and yield
Flexible Customization
allows process engineers to embed domain knowledge in feature selection and modeling
Aggregate Modeling
builds individualized models across multiple tools and machines for the same process
Featured icon white circle
Automatic Model Update
enables the model to quickly relearn without any manual intervention
DOWNLOAD

SK hynix Deploys Gauss Labs’s AI-Based Virtual Metrology Solution to Predict Wafer Manufacturing Process Outcomes

By predicting wafer process outcomes based on sensor data, Panoptes VM reduces process variability by 21.5% on average and ultimately improves the yield as well.
Learn More

Download the product brochure

DOWNLOAD
DOWNLOAD