[Gaussian Waves] #12 Gauss Labs x SPIE AL 2025: Multi-task Baseline Model for Image Metrology

May 1, 2025

At Gauss Labs, we continue to thrive, search for innovative methods to revolutionize manufacturing. As the last series of our publications at SPIE AL, learn about SiliconBASE, our latest research on image metrology.

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[Paper] SiliconBASE: Multi-Task Baseline Model for Semiconductor Metrology and Inspection Applications

April 24, 2025

SiliconBASE is a novel, unsupervised learning architecture designed for semiconductor metrology and inspection able to overcome the limitations of traditional CNN approaches, learning from unlabeled data and providing flexible object detection and segmentation.

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[Paper] A grid mapping-based U-net algorithm for photolithography overlay virtual metrology

April 24, 2025

This paper proposes a high-accuracy virtual metrology algorithm for overlay error prediction in photolithography that integrates multi-modal metrology data and TwinUNets.

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[Paper] High-performing virtual metrology with group-wise feature transformation and advanced data aggregation techniques

April 24, 2025

This paper addresses the challenge of poor data quality and quantity in semiconductor manufacturing by introducing advanced data aggregation techniques and a data-driven group-wise feature transformation module (GroFT) that clusters features with similar characteristics dynamically.

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[Gaussian Waves] #11 Gauss Labs x SPIE AL 2025: Group-Wise Feature Transformation for Virtual Metrology

April 11, 2025

🚀 At Gauss Labs, we push the envelope of innovation not just for our product, but for manufacturing as a whole. Continuing our SPIE AL series, we’re proud to introduce GRoFT: our method for improving virtual metrology prediction accuracy through group-wise feature transformations.

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[Gaussian Waves] #10 Gauss Labs x SPIE AL 2025: A Novel Method for Overlay Virtual Metrology

March 28, 2025

At Gauss Labs, we don't create just for the sake of innovation, but also for impact. Learn about our newest research in our newsletter, Gaussian Waves. This edition focuses on predicting overlay errors in semiconductor manufacturing! We are Gauss Labs, and we revolutionize manufacturing with AI.

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[Gaussian Waves] #9 You Need Virtual Metrology in Your Fab

January 13, 2025

Learn about how you can benefit from virtual metrology and overcoming the challenges of physical metrology in our latest edition of Gaussian Waves.

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[Gaussian Waves] #8 A Look Back on 4 Years of Gauss Labs

August 13, 2024

Gauss Labs is officially 4 years old! Join us as we reflect on our triumphs achieved so far, and learn more about where we plan to go next.

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[Paper] The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology

June 6, 2024

This paper develops a framework to study the tradeoff between sampling rate, delay, and measurement quality for in-line metrology and the effects on process variability in high-volume manufacturing.

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[Paper] Universal Denoiser to Improve Metrology Throughput

April 9, 2024

Our universal denoising method for semiconductor metrology maintains precision with specialized networks and conditioning schemes tailored for nano-scale semiconductor images.

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[Paper] Model aggregation for virtual metrology in high-volume manufacturing

April 9, 2024

This paper introduces an aggregated adaptive online model (AggAOM) to address virtual metrology's limited deployment in semiconductor manufacturing due to accuracy and scalability issues caused by data drift, sparse ground-truth data, and inconsistent data quality.

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[Paper] PNI: Industrial Anomaly Detection using Position and Neighborhood Information

January 15, 2024

PNI improves anomaly detection by incorporating neighborhood and position information into normal feature distribution modeling, achieving state-of-the-art performance.

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Happy New Year, 2024!

January 8, 2024

Happy New Years from Gauss Labs to you!

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[Gaussian Waves] #6 Panoptes VM - Operable at the Fab Scale

December 15, 2023

One of the most important use cases of virtual metrology is advanced process control (APC). Learn more about how Panoptes VM is built on the state-of-the-art machine learning system architecture, making it a one-of-a-kind ML platform for reliable operations in high-volume manufacturing.

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[Gaussian Waves] #5 Panoptes VM - Built for Engineers by Engineers

October 18, 2023

A solution built for engineers by engineers, Panoptes VM is a purpose specific solution designed for high volume manufacturing.

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[Gaussian Waves] #4 Highly Accurate Whenever Wherever!

August 4, 2023

Accurate metrology faces many challenges. Learn how Panoptes VM tackles manufacturing pain points with algorithms designed specifically for manufacturing.

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[Gaussian Waves] #3 The Age of Virtual Metrology Begins

May 25, 2023

Is there an alternative approach to overcoming the fundamental limitations of hardware-based monitoring? The answer is “Panoptes,” providing advanced and extensive monitoring and metrology capabilities without adding new hardware.

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[Paper] Adaptive Online Time-Series Prediction for Virtual Metrology in Semiconductor Manufacturing

May 12, 2023

This paper proposes a novel virtual metrology method that uses adaptive online time-series learning to handle data drifts and shifts in semiconductor manufacturing through time-aware normalization and adaptive learning algorithms.

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[Gaussian Waves] #2 Transforming the manufacturing industry with AI!

March 24, 2023

Learn how Gauss Labs is transforming the manufacturing industry with AI powered virtual and image metrology solutions.

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[Gaussian Waves] #1 Gauss Labs’s Greetings for 2023!

January 19, 2023

Happy new year from Gauss Labs! Looking forward from our last 2 years, we are opening this new chapter of 2023 with strong, positive momentum and fascinating plots to follow.

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